论文信息 - Impact of the Plasma Ambient and the Ruthenium Precursor on the Growth of Ruthenium Films by Plasma Enhanced Atomic Layer Deposition - 字舞流文

Impact of the Plasma Ambient and the Ruthenium Precursor on the Growth of Ruthenium Films by Plasma Enhanced Atomic Layer Deposition

J. Swerts | M. Schaekers | A. Delabie | M. Popovici | Min-Soo Kim | M. Salimullah | S. Elshocht