The impact of impurity incorporation on heterojunction bipolar transistors grown by metalorganic molecular beam epitaxy

[1]  C. Abernathy Growth of III-V materials by metalorganic molecular-beam epitaxy , 1993 .

[2]  P. Wisk,et al.  Growth of InGaP by metalorganic molecular beam epitaxy using novel Ga sources , 1993 .

[3]  P. Wisk,et al.  Small area InGaP emitter/carbon doped GaAs base HBTs grown by MOMBE , 1992 .

[4]  T. Martin,et al.  Tri‐isopropyl gallium: A very promising precursor for chemical beam epitaxy , 1992 .

[5]  P. Wisk,et al.  Comparison of triethylgallium and tri-isobutylgallium for growth of GaAs and AlGaAs by metalorganic molecular beam epitaxy , 1992 .

[6]  B. Sermage,et al.  Very high gain in carbon-doped base heterojunction bipolar transistor grown by chemical beam epitaxy , 1992 .

[7]  P. Wisk,et al.  InGaP/GaAs Based Single and Double Heterojunction Bipolar Transistors Grown by MOMBE , 1992 .

[8]  G. J. Davies,et al.  Applications of MBMS and surface spectroscopic techniques in the study of reaction mechanisms in CBE; investigations of the reactivity of tritertiarybutylgallium and triisobutylgallium as alternative precursors for epilayer growth , 1992 .

[9]  P. Wisk,et al.  Carbon and tin doped npn and pnp AlGaAs/GaAs HBTs grown by MOMBE , 1991 .

[10]  F. Ren,et al.  Novel carbon‐doped p‐channel GaAs metal‐semiconductor field‐effect transistor grown by metalorganic molecular beam epitaxy , 1991 .

[11]  J. C. Garcia,et al.  Chemical beam epitaxy growth of GaAs/Ga0.5In0.5P heterostructures: growth kinetics, electrical and optical properties , 1991 .

[12]  S. Pearton,et al.  The role of aluminum and hydrogen in impurity contamination of AlGaAs grown by MOMBE , 1991 .

[13]  G. Scilla,et al.  Use of CCl4 and CHCl3 in gas source molecular beam epitaxy for carbon doping of GaAs and GaxIn1−xP , 1991 .

[14]  A. S. Jordan,et al.  Effect of source chemistry and growth parameters on AlGaAs grown by metalorganic molecular beam epitaxy , 1991 .

[15]  C. Daguet,et al.  Incorporation of group III and group V elements in chemical beam epitaxy of GaInAsP alloys , 1991 .

[16]  C. Abernathy Carbon incorporation in GaAs and AlGaAs grown by MOMBE using trimethlgallium , 1991 .

[17]  F. Alexandre,et al.  Heavily doped base GaInP/GaAs heterojunction bipolar transistor grown by chemical beam epitaxy , 1990 .

[18]  A. S. Jordan,et al.  Carbon doping of III–V compounds grown by MOMBE , 1990 .

[19]  S. Nozaki,et al.  Metallic p-type GaAs and InGaAs grown by MOMBE , 1990 .

[20]  T. Martin,et al.  Modulated-beam mass spectrometry studies of the MOMBE growth of (100) GaAs and In0.1Ga0.9As , 1990 .

[21]  W. S. Hobson,et al.  Growth of high quality AlGaAs by metalorganic molecular beam epitaxy using trimethylamine alane , 1990 .

[22]  A. S. Jordan,et al.  GaAs-AlGaAs HBT with carbon doped base layer grown by MOMBE , 1990 .

[23]  G. B. Stringfellow Organometallic Vapor-Phase Epitaxy: Theory and Practice , 1989 .

[24]  H. Matsunami,et al.  Metalorganic molecular‐beam epitaxy of InGaP , 1989 .

[25]  M. Konagai,et al.  Characterization of p‐type GaAs heavily doped with carbon grown by metalorganic molecular‐beam epitaxy , 1988 .

[26]  S. Pearton,et al.  Hydrogen in crystalline semiconductors , 1992 .

[27]  H. Kroemer,et al.  Heterostructure bipolar transistors and integrated circuits , 1982, Proceedings of the IEEE.