Franz–Keldysh oscillations in modulation spectroscopy

In the presence of an electric field, the dielectric constant of a semiconductor exhibits Franz–Keldysh oscillations (FKO), which can be detected by modulated reflectance. Although it could be a powerful and simple method to study the electric fields/charge distributions in various semiconductor structures, in the past it has proven to be more complex. This is due to nonuniform fields and impurity induced broadening, which reduce the number of detectible Franz–Keldysh oscillations, and introduce uncertainties into the measurement. In 1989, a new structure, surface–undoped–doped (s‐i‐n+/s‐i‐p+) was developed, which allows the observation of a large number of FKOs and, hence, permitting accurate determination of electric fields. We present a review of the work on measuring electric fields in semiconductors with a particular emphasis on microstructures using the specialized layer sequence. We first discuss the general theory of modulation techniques dwelling on the approximations and their relevance. The cas...

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