Charged Particle Microscopy: Why Mass Matters
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[1] H. Salemink,et al. Sub-10-nm nanolithography with a scanning helium beam , 2009 .
[2] Brendan Griffin,et al. A model of secondary electron imaging in the helium ion scanning microscope. , 2009, Ultramicroscopy.
[3] S. Schwarz. Secondary Ion Mass Spectroscopy , 2001 .
[4] J. Notte,et al. Analysis and metrology with a focused helium ion beama) , 2010 .
[5] J. Ziegler. The stopping and range of ions in solids vol 1 : The stopping and ranges of ions in matter , 2013 .
[6] P. Hadley,et al. Electron Beam-Induced Current (EBIC) in solution-processed solar cells. , 2011, Scanning.
[7] Henry I. Smith,et al. Membrane folding by helium ion implantation for three-dimensional device fabrication , 2007 .
[8] D. Joy,et al. Is Microanalysis Possible in the Helium Ion Microscope? , 2011, Microscopy and Microanalysis.
[9] The neon gas field ion source—a first characterization of neon nanomachining properties , 2011 .
[10] Samuel M. Nicaise,et al. Neon Ion Beam Lithography (NIBL). , 2011, Nano letters.
[11] Richard H. Livengood,et al. Subsurface damage from helium ions as a function of dose, beam energy, and dose rate , 2009 .
[12] L. Reimer,et al. Scanning Electron Microscopy , 1984 .
[13] L. Reimer. Scanning Electron Microscopy: Physics of Image Formation and Microanalysis , 1984 .
[14] C. Hagen,et al. Simulation of ion imaging: sputtering, contrast, noise. , 2011, Ultramicroscopy.
[15] J. E. Barth,et al. Addition of different contributions to the charged particle probe size , 1996 .
[16] Bryan M. Cord,et al. Limiting factors in sub- 10 nm scanning-electron-beam lithography , 2009 .
[17] H. Mizuta,et al. Focused helium ion beam milling and deposition , 2011 .
[18] R. Hill,et al. Scanning Helium Ion Microscopy , 2012 .