a-GIZO TFT neural modeling, circuit simulation and validation

Abstract Development time and accuracy are measures that need to be taken into account when devising device models for a new technology. If complex circuits need to be designed immediately, then it is very important to reduce the time taken to realize the model. Solely based on data measurements, artificial neural networks (ANNs) modeling methodologies are capable of capturing small and large signal behavior of the transistor, with good accuracy, thus becoming excellent alternatives to more strenuous modeling approaches, such as physical and semi-empirical. This paper then addresses a static modeling methodology for amorphous Gallium–Indium–Zinc-Oxide – Thin Film Transistor (a-GIZO TFT), with different ANNs, namely: multilayer perceptron (MLP), radial basis functions (RBF) and least squares-support vector machine (LS-SVM). The modeling performance is validated by comparing the model outcome with measured data extracted from a real device. In case of a single transistor modeling and under the same training conditions, all the ANN approaches revealed a very good level of accuracy for large- and small-signal parameters ( g m and g d ), both in linear and saturation regions. However, in comparison to RBF and LS-SVM, the MLP achieves a very acceptable degree of accuracy with lesser complexity. The impact on simulation time is strongly related with model complexity, revealing that MLP is the most suitable approach for circuit simulations among the three ANNs. Accordingly, MLP is then extended for multiple TFTs with different aspect ratios and the network implemented in Verilog-A to be used with electric simulators. Further, a simple circuit (inverter) is simulated from the developed model and then the simulation outcome is validated with the fabricated circuit response.

[1]  JianJang Huang,et al.  Characterizations of Amorphous IGZO Thin-Film Transistors With Low Subthreshold Swing , 2011, IEEE Electron Device Letters.

[2]  Johan A. K. Suykens,et al.  Least Squares Support Vector Machines , 2002 .

[3]  Sung-Min Yoon,et al.  Analytical Modeling of IGZO Thin-Film Transistors Based on the Exponential Distribution of Deep and Tail States , 2009 .

[4]  E. Fortunato,et al.  Transparent Oxide Electronics: From Materials to Devices , 2012 .

[5]  Dong Myong Kim,et al.  Physical Parameter-Based SPICE Models for InGaZnO Thin-Film Transistors Applicable to Process Optimization and Robust Circuit Design , 2012, IEEE Electron Device Letters.

[6]  D. Foty MOSFET modeling for circuit simulation , 1998 .

[7]  E. Fortunato,et al.  Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances , 2012, Advanced materials.

[8]  P. Heremans,et al.  Low-voltage gallium–indium–zinc–oxide thin film transistors based logic circuits on thin plastic foil: Building blocks for radio frequency identification application , 2011 .

[9]  Mohsen Hayati,et al.  CNT-MOSFET modeling based on artificial neural network: Application to simulation of nanoscale circuits , 2010 .

[10]  Iltcho Angelov Empirical FET models , 2006 .

[11]  G. Foty Effective MOSFET modeling for SPICE circuit simulation , 1998, Northcon/98. Conference Proceedings (Cat. No.98CH36264).

[12]  Sanjiv Sambandan,et al.  Analogue circuit building blocks with amorphous silicon thin film transistors , 2005 .

[13]  Pedro Barquinha,et al.  Influence of the semiconductor thickness on the electrical properties of transparent TFTs based on indium zinc oxide , 2006 .

[14]  Kurt Hornik,et al.  Multilayer feedforward networks are universal approximators , 1989, Neural Networks.

[15]  Pedro Barquinha,et al.  Toward High-Performance Amorphous GIZO TFTs , 2009 .

[16]  M. Chahdi,et al.  An approach based on neural computation to simulate the nanoscale CMOS circuits: Application to the simulation of CMOS inverter , 2007 .

[17]  Simon Haykin,et al.  Neural Networks: A Comprehensive Foundation , 1998 .

[18]  Min-Koo Han,et al.  Effect of channel widths on negative shift of threshold voltage, including stress-induced hump phenomenon in InGaZnO thin-film transistors under high-gate and drain bias stress , 2012 .

[19]  Pedro Barquinha,et al.  Gate-bias stress in amorphous oxide semiconductors thin-film transistors , 2009 .

[20]  Jun Huang,et al.  Performance and stability of amorphous InGaZnO thin film transistors with a designed device structure , 2011 .

[21]  P.B.L. Meijer Table models for device modelling , 1988, 1988., IEEE International Symposium on Circuits and Systems.

[22]  Chi-Sun Hwang,et al.  Modeling of amorphous InGaZnO thin film transistors using an empirical mobility function based on the exponential deep and tail states , 2012 .

[23]  K. Suyama,et al.  MOSFET modeling for analog circuit CAD: Problems and prospects , 1993, Proceedings of IEEE Custom Integrated Circuits Conference - CICC '93.

[24]  Michiel Steyaert,et al.  A Fully Integrated $\Delta \Sigma$ ADC in Organic Thin-Film Transistor Technology on Flexible Plastic Foil , 2011, IEEE Journal of Solid-State Circuits.

[25]  E. Fortunato,et al.  Performance and Stability of Low Temperature Transparent Thin-Film Transistors Using Amorphous Multicomponent Dielectrics , 2009 .

[26]  Zeljko Mrcarica,et al.  MOS transistor modelling using neural network , 1992 .

[27]  Jang-Yeon Kwon,et al.  42.2: World's Largest (15‐inch) XGA AMLCD Panel Using IGZO Oxide TFT , 2008 .

[28]  Hai Zhou,et al.  High-Performance Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors With $\hbox{HfO}_{x}\hbox{N}_{y}/\hbox{HfO}_{2}/\hbox{HfO}_{x}\hbox{N}_{y}$ Tristack Gate Dielectrics , 2011, IEEE Electron Device Letters.

[29]  P. Barquinha,et al.  Gallium–Indium–Zinc-Oxide-Based Thin-Film Transistors: Influence of the Source/Drain Material , 2008, IEEE Transactions on Electron Devices.