论文信息 - A Two-Step-Recess Process Based on Atomic-Layer Etching for High-Performance p-HEMTs - 字舞流文

A Two-Step-Recess Process Based on Atomic-Layer Etching for High-Performance p-HEMTs

Daehyun Kim | Young-woon Kim | Tae-Woo Kim | S. Shin | Jae‐Hyung Jang | G. Yeom | Ho-Jin Song | Jong-In Song | Sang-Duk Park | S. Jo | Young Min Park | Jeoun-Oun Bae