Total Ionizing Dose Effects on hBN Encapsulated Graphene Devices

The constant-voltage electrical stress and 10-keV X-ray irradiation responses of encapsulated graphene-hBN devices are evaluated. Both constant-voltage stress and X-ray exposure induce only modest shifts in the current and the Dirac point of the graphene. Charge trapping at or near the graphene/BN interface is observed after X-ray irradiation. The experimental results suggest that net hole trapping occurs in the BN at low doses and that net electron trapping occurs at higher doses. First-principles calculations also demonstrate that hydrogenated substitutional carbon impurities at B/N sites at or near the graphene/BN interface can play an additional role in the radiation response of these structures.

[1]  P. Kim,et al.  Temperature-dependent transport in suspended graphene. , 2008, Physical review letters.

[2]  S. Tadigadapa,et al.  Intrinsic doping and gate hysteresis in graphene field effect devices fabricated on SiO2 substrates , 2010, Journal of physics. Condensed matter : an Institute of Physics journal.

[3]  K. Novoselov,et al.  Micrometer-scale ballistic transport in encapsulated graphene at room temperature. , 2011, Nano letters.

[4]  G. Kresse,et al.  From ultrasoft pseudopotentials to the projector augmented-wave method , 1999 .

[5]  E. Williams,et al.  Charged Impurity Scattering in Graphene , 2007, 0708.2408.

[6]  G. Fudenberg,et al.  Ultrahigh electron mobility in suspended graphene , 2008, 0802.2389.

[7]  K. Novoselov,et al.  Giant intrinsic carrier mobilities in graphene and its bilayer. , 2007, Physical review letters.

[8]  P. S. Winokur,et al.  Correlating the Radiation Response of MOS Capacitors and Transistors , 1984, IEEE Transactions on Nuclear Science.

[9]  Blöchl,et al.  Projector augmented-wave method. , 1994, Physical review. B, Condensed matter.

[10]  I. Esqueda,et al.  Total Ionizing Dose Induced Charge Carrier Scattering in Graphene Devices , 2012, IEEE Transactions on Nuclear Science.

[11]  T. Oldham,et al.  Total ionizing dose effects in MOS oxides and devices , 2003 .

[12]  P. Winokur,et al.  Simple technique for separating the effects of interface traps and trapped‐oxide charge in metal‐oxide‐semiconductor transistors , 1986 .

[13]  A. Zunger,et al.  Point defects in hexagonal boron nitride. I. EPR, thermoluminescence, and thermally-stimulated-current measurements , 1975 .

[14]  N. Peres,et al.  Electron tunneling through ultrathin boron nitride crystalline barriers. , 2012, Nano letters.

[15]  Burke,et al.  Generalized Gradient Approximation Made Simple. , 1996, Physical review letters.

[16]  Qiang Li,et al.  Toward intrinsic graphene surfaces: a systematic study on thermal annealing and wet-chemical treatment of SiO2-supported graphene devices. , 2011, Nano letters.

[17]  T. Ando Screening Effect and Impurity Scattering in Monolayer Graphene(Condensed matter: electronic structure and electrical, magnetic, and optical properties) , 2006 .

[18]  S. Sarma,et al.  Measurement of scattering rate and minimum conductivity in graphene. , 2007, Physical review letters.

[19]  P. Eklund,et al.  n-Type behavior of graphene supported on Si/SiO(2) substrates. , 2008, ACS nano.

[20]  K. Klitzing,et al.  Observation of electron–hole puddles in graphene using a scanning single-electron transistor , 2007, 0705.2180.

[21]  En Xia Zhang,et al.  Electrical Stress and Total Ionizing Dose Effects on Graphene-Based Non-Volatile Memory Devices , 2012, IEEE Transactions on Nuclear Science.

[22]  Y. Yaish,et al.  Water-assisted mobile charge induced screening and origin of hysteresis in carbon nanotube field-effect transistors , 2012 .

[23]  N. Peres,et al.  Electron tunneling through ultrathin boron nitride crystalline barriers. , 2012, Nano letters.

[24]  Kresse,et al.  Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set. , 1996, Physical review. B, Condensed matter.

[25]  Ronald D. Schrimpf,et al.  Hydrogen in MOSFETs - A primary agent of reliability issues , 2007, Microelectron. Reliab..

[26]  Yang Wang,et al.  Local electronic properties of graphene on a BN substrate via scanning tunneling microscopy. , 2011, Nano letters.

[27]  A. Krasheninnikov,et al.  Mechanisms of postsynthesis doping of boron nitride nanostructures with carbon from first-principles simulations. , 2011, Physical review letters.

[28]  K. Shepard,et al.  Boron nitride substrates for high-quality graphene electronics. , 2010, Nature nanotechnology.

[29]  S. Pennycook,et al.  Atom-by-atom structural and chemical analysis by annular dark-field electron microscopy , 2010, Nature.

[30]  Daniel M. Fleetwood,et al.  Effects of hydrogen transport and reactions on microelectronics radiation response and reliability , 2002, Microelectron. Reliab..

[31]  Phaedon Avouris,et al.  Controllable p-n junction formation in monolayer graphene using electrostatic substrate engineering. , 2010, Nano letters.

[32]  D. Maroudas,et al.  Hydrogenation effects on the structure and morphology of graphene and single-walled carbon nanotubes , 2010 .

[33]  Bing Huang,et al.  Defect and impurity properties of hexagonal boron nitride: A first-principles calculation , 2012 .

[34]  L. Wirtz,et al.  Coupling of excitons and defect states in boron-nitride nanostructures , 2011, 1103.2628.

[35]  J.A. Felix,et al.  Radiation Effects in MOS Oxides , 2008, IEEE Transactions on Nuclear Science.

[36]  F. Guinea,et al.  Limits on charge carrier mobility in suspended graphene due to flexural phonons. , 2010, Physical review letters.

[37]  K. Shepard,et al.  Graphene field-effect transistors based on boron nitride gate dielectrics , 2010, 2010 International Electron Devices Meeting.

[38]  E. Williams,et al.  Atomic structure of graphene on SiO2. , 2007, Nano letters.

[39]  Tony F. Heinz,et al.  Ultraflat graphene , 2009, Nature.

[40]  Andre K. Geim,et al.  Two-dimensional atomic crystals. , 2005, Proceedings of the National Academy of Sciences of the United States of America.

[41]  Local electrical stress-induced doping and formation of monolayer graphene P-N junction , 2011, 1103.4568.

[42]  Ophir Vermesh,et al.  Hysteresis caused by water molecules in carbon nanotube field-effect transistors , 2003 .

[43]  Bin Wang,et al.  Low-Energy X-ray and Ozone-Exposure Induced Defect Formation in Graphene Materials and Devices , 2011, IEEE Transactions on Nuclear Science.

[44]  F. Guinea,et al.  The electronic properties of graphene , 2007, Reviews of Modern Physics.