Self-terminating protocol for an interfacial complexation reaction in vacuo by metal-organic chemical vapor deposition.
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R. Acres | K. Prince | J. Barth | D. Écija | W. Auwärter | J. Reichert | Saranyan Vijayaraghavan | F. Allegretti | K. Diller | F. Klappenberger | K. Seufert | S. Fischer | A. Papageorgiou | S. Oh | A. Wiengarten | Ozge Sağlam