Efficient method for determination of laser conditions adopted in laser-induced micro-lithology based on laser polymerization size analysis

Since negative photoresist SU-8 has become a common material for multi-photon micro-lithology, it is necessary to study laser conditions adopted in lithology process. Optical transmittance of SU-8 was tested. According to Urbach optical-absorption theory and Gaussian laser lateral spatial intensity envelope, relationship between theory and actual polymerization size of SU-8 was shown. Experimentally, we investigated multi-photon polymerization threshold and laser-induced damage of SU-8 under femtosecond laser irradiation with the pulse width of 45 fs at 800 nm by 1-on-1 tests. The polymerization and damage threshold at 45 fs are 2.7 and 8.9 TW/cm2, respectively. Polymerization and damage morphologies are shown with high contrast and polymerization sizes are measured under SEM. Theoretical polymerization sizes versus laser fluence are calculated by laser-induce multi-photon polymerization size analysis (LMPSA), including Urbach optical-absorption theory and Gaussian laser lateral spatial intensity distribution. The calculated results show that diffusion exists in the femtosecond laser-induced polymerization.

[1]  Sang-Pil Han,et al.  Photonic band gaps and defect modes of polymer photonic crystal slabs , 2005 .

[2]  W. H. Teh,et al.  Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography , 2005 .

[3]  Satoshi Kawata,et al.  Temperature effects on pinpoint photopolymerization and polymerized micronanostructures , 2008 .

[4]  Vaidya Nathan,et al.  Near-bandgap infrared absorption properties of HgCdTe , 2004 .

[5]  B J Schwartz,et al.  Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures. , 1998, Optics letters.

[6]  Satoshi Kawata,et al.  Finer features for functional microdevices , 2001, Nature.

[7]  Xian-Zi Dong,et al.  Improving spatial resolution and reducing aspect ratio in multiphoton polymerization nanofabrication , 2008 .

[8]  Xiang Zhang,et al.  Diffusion-limited photopolymerization in scanning micro-stereolithography , 2004 .

[9]  S. Juodkazis,et al.  Thermal diffusivity in femtosecond-laser-structured micro-volumes of polymers , 2010 .

[10]  Saulius Juodkazis,et al.  Two-photon lithography of nanorods in SU-8 photoresist , 2005 .

[11]  J. Fischer,et al.  Three-dimensional multi-photon direct laser writing with variable repetition rate. , 2013, Optics express.

[12]  Raymond C Rumpf,et al.  Fully three-dimensional modeling of the fabrication and behavior of photonic crystals formed by holographic lithography. , 2004, Journal of the Optical Society of America. A, Optics, image science, and vision.

[13]  J. Fischer,et al.  In-situ local temperature measurement during three-dimensional direct laser writing , 2013, CLEO: 2013.

[14]  Martin Wegener,et al.  Polymerization Kinetics in Three‐Dimensional Direct Laser Writing , 2014, Advanced materials.

[15]  Helmut Schift,et al.  High volume fabrication of customised nanopore membrane chips , 2003 .