论文信息 - Analysis of a TEOS/Oxygen Plasma: Influence of Energy and Particle Flux on the Deposition Parameters - 字舞流文

Analysis of a TEOS/Oxygen Plasma: Influence of Energy and Particle Flux on the Deposition Parameters

J. Santiago-Avilés | A. N. R. D. Silva | M. L. P. D. Silva

[1] J. Riveros,et al. A comparative study of gas-phase ion/molecule reactions in Si(OCH3)4 and Si(OC2H5)4 , 1997 .

[2] J. Riveros,et al. Experimental and Theoretical Characterization of FSi(OCH3)2(OCH2)-: A Gas Phase Fluoride−Siloxirane Adduct , 1997 .

[3] J. Riveros,et al. Gas‐phase nucleophilic reactions in tetraalkoxysilanes , 1995 .