Method of forming an image for semiconductor device and method of inspecting defects for semiconductor device using the same

PURPOSE: A method of forming an image of a semiconductor device and a method for inspecting defects of a semiconductor device using the same are provided to simply produce the final image of a specimen by selecting partial image frames of a plurality of image frames. CONSTITUTION: A semiconductor device having an interest area and a peripheral area is prepared(S110). A plurality of image frames, which includes the interest image and the peripheral area image respectively corresponding to the interest area and the peripheral area, is obtained(S120). At least a part of the plurality of image frames is selected(S130). The image of the semiconductor device is obtained by integrating selected image frames(S140).