The reorganization processes at submicron level of the polymeric materials have been investigated because of their applications in optoelectronics and bio-science. We have obtained surface relief modulation in single step processing on the photo resist and polysiloxane films. But for technical applications the time evolution and stability of the induced surface structure is an important parameter and is a problem to be discussed. In case of single step surface relief formation on polymeric materials the process is connected with the photochromic behavior of the materials. As it is known the UV light induced effects on the material structure are reversible under the action of visible light, but with different speeds. In this report is analyzed the time evolution of the surface modulation obtained under the action of the UV light for azopolymers with different structures.