Optimization of an inductively coupled plasma etching process of GaInP/GaAs based material for photonic band gap applications
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J. Nagle | S. Combrie | H. Benisty | O. Parillaud | S. Cassette | S. Bansropun | M. Lecomte | S. Combrié
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J. Nagle | S. Combrie | H. Benisty | O. Parillaud | S. Cassette | S. Bansropun | M. Lecomte | S. Combrié