High Aspect Ratio Sub‐15 nm Silicon Trenches From Block Copolymer Templates
暂无分享,去创建一个
Xiaodan Gu | X. Gu | T. Russell | I. Gunkel | D. Olynick | S. Chourou | Zuwei Liu | S. Hong | Thomas P Russell | Deirdre L Olynick | Sung Woo Hong | Zuwei Liu | Ilja Gunkel | S T Chourou
[1] Soojin Park,et al. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order , 2009, Science.
[2] Jinan Chai,et al. Using cylindrical domains of block copolymers to self-assemble and align metallic nanowires. , 2008, ACS nano.
[3] T. Metzger,et al. Depth Profiling of the Lateral Pore Size and Correlation Distance in Thin Porous Silicon Layers by Grazing Incidence Small Angle X-Ray Scattering , 2003 .
[4] Y. Jung,et al. Fabrication of diverse metallic nanowire arrays based on block copolymer self-assembly. , 2010, Nano letters.
[5] Edwin L. Thomas,et al. Nanostructured Thin Films of Organic–Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching , 2000 .
[6] Nobufumi Atoda,et al. Mechanism of Resist Pattern Collapse during Development Process , 1993 .
[7] Christopher Harrison,et al. Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter , 1997 .
[8] Justin D. Holmes,et al. Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods , 2010 .
[9] P. Nealey,et al. Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching , 2007 .
[10] G. Fredrickson,et al. Block Copolymers—Designer Soft Materials , 1999 .
[11] Leonidas E. Ocola,et al. Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis , 2011 .
[12] Nicolas H Voelcker,et al. Porous silicon biosensors on the advance. , 2009, Trends in biotechnology.
[13] Brian C. Berry,et al. Observation of surface corrugation-induced alignment of lamellar microdomains in PS-b-PMMA thin films , 2009 .
[14] K. Guarini,et al. Block Copolymer Surface Reconstuction: A Reversible Route to Nanoporous Films , 2003 .
[15] Y. Jung,et al. Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer. , 2007, Nano letters.
[16] S. Darling,et al. Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers , 2010, Advanced materials.
[17] Edwin L. Thomas,et al. Monolayer films of diblock copolymer microdomains for nanolithographic applications , 1995, Journal of Materials Science.
[18] Kim Y. Lee,et al. Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2 , 2011, Advanced materials.
[19] Seth B Darling,et al. A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates. , 2011, ACS nano.
[20] Soo-Jin Park,et al. Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films , 2008 .
[21] C. Hawker,et al. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns , 2009, Advanced materials.
[22] Justin D. Holmes,et al. Plasma etch technologies for the development of ultra-small feature size transistor devices , 2011 .
[23] Wonjoon Jung,et al. Nanofabricated concentric ring structures by templated self-assembly of a diblock copolymer. , 2008, Nano letters.
[24] J. Buriak,et al. Chemical and Biological Applications of Porous Silicon Technology , 2000 .
[25] Henry I. Smith,et al. Fabrication of nanostructures with long-range order using block copolymer lithography , 2002 .
[26] Jillian M. Buriak,et al. Assembly of aligned linear metallic patterns on silicon , 2007, Nature Nanotechnology.
[27] Y. Jung,et al. Well-ordered thin-film nanopore arrays formed using a block-copolymer template. , 2009, Small.