论文信息 - HfO2 as gate dielectric on Ge: interfaces and deposition techniques - 字舞流文

HfO2 as gate dielectric on Ge: interfaces and deposition techniques

S. Spiga | M. Fanciulli | M. Caymax | A. Dimoulas | T. Conard | M. Meuris | M. Houssa | A. Delabie | J. Seo | S. Elshocht | M. Heyns | L. Goncharova