论文信息 - Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions☆ - 字舞流文

Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions☆

U. Heinzmann | A. Szekeres | F. Hamelmann | S. Simeonov | A. Brechling | A. Aschentrup | A. Gushterov