Through-focus EUV multilayer defect repair with nanomachining
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Emily Gallagher | Gregory McIntyre | Roy White | Ron Bozak | Mark Lawliss | Adam C. Smith | Tod Robinson | Michael Archuletta | Jeffrey LeClaire
[1] Chris Clifford. Simulation and compensation methods for EUV lithography masks with buried defects , 2010 .
[2] Donald W. Sweeney,et al. Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography , 2001 .
[3] Ying Li,et al. EUV multilayer defect compensation (MDC) by absorber pattern modification: improved performance with deposited material and other progresses , 2012, Photomask Technology.
[4] Tadahiko Takikawa,et al. EUVL practical mask structure with light shield area for 32nm half pitch and beyond , 2008, Photomask Technology.
[5] Ken Roessler,et al. Clean and repair of EUV photomasks , 2011, Photomask Technology.
[6] Anthony Garetto,et al. Status of the AIMS(TM) EUV Project , 2012, Photomask Technology.
[7] Masaki Satake,et al. EUV mask absorber and multi-layer defect disposition techniques using computational lithography , 2011, Photomask Technology.
[8] Masaki Satake,et al. EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation , 2011, Photomask Technology.
[9] Gregory McIntyre,et al. EUVL mask repair: expanding options with nanomachining , 2012, Photomask Technology.
[10] Roy White,et al. Qualification of BitClean technology in photomask production , 2010, Photomask Technology.
[11] T. Bret,et al. Repair of natural EUV reticle defects , 2011, Photomask Technology.
[12] Guido Schiffelers,et al. ASML's NXE platform performance and volume introduction , 2013, Advanced Lithography.
[13] Andrew R. Neureuther,et al. Fast simulation methods and modeling for extreme ultraviolet masks with buried defects , 2009 .
[14] Fast Simulation Methods for Non-Planar Phase and Multilayer Defects in DUV and EUV Photomasks for Lithography , 2005 .