论文信息 - Electrical properties of TiO 2 -based MIM capacitors deposited by TiCl 4 and TTIP based atomic layer deposition processes - 字舞流文

Electrical properties of TiO 2 -based MIM capacitors deposited by TiCl 4 and TTIP based atomic layer deposition processes

C. Hwang | J. Han | J. Aarik | Seul Ji Song | Woongkyu Lee | B. Hudec | A. Tarre | A. Kasikov | K. Fröhlich | A. Rosová | Sora Han | K. Hušeková | S. Han