High rate growth of thick diamond films by high-current hot-cathode PCVD

[1]  Zhigang Jiang,et al.  Influence of cathode temperature on gas discharge and growth of diamond films in DC-PCVD processing , 2005 .

[2]  Toshimichi Ito,et al.  Homoepitaxial diamond growth by high-power microwave-plasma chemical vapor deposition , 2004 .

[3]  A. Fernandes,et al.  Influence of nucleation density on film quality, growth rate and morphology of thick CVD diamond films , 2003 .

[4]  J. Schermer,et al.  On the mechanism of texturing during flame deposition of diamond , 2002 .

[5]  K. J. Gray,et al.  Free-standing CVD diamond wafers for thermal management by d.c. arc jet technology , 1999 .

[6]  J. S. Aitchison,et al.  Micromachined pattern transfer into CVD diamond , 1998 .

[7]  G. Zou,et al.  The deposition of diamond film with high thermal conductivity , 1997 .

[8]  A. Malshe,et al.  Reactive ion etching of diamond as a means of enhancing chemically-assisted mechanical polishing efficiency , 1997 .

[9]  K. J. Gray,et al.  Design-to-implementation case studies of CVD diamond in r.f./microwave package and detector applications , 1997 .

[10]  M. N. Petukhov,et al.  The roles of H and O atoms in diamond growth , 1997 .

[11]  E. Cappelli,et al.  Relation among growth rate, microstructure and the physical properties of diamond films , 1996 .

[12]  Kazuhiro Baba,et al.  Thermal conductivity of diamond films , 1991 .

[13]  Wang,et al.  Detailed surface and gas-phase chemical kinetics of diamond deposition. , 1991, Physical review. B, Condensed matter.

[14]  S. Harris,et al.  Effects of oxygen on diamond growth , 1989 .