Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films
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R. Waser | N. Aslam | S. Hoffmann‐Eifert | F. Roozeboom | W. Keuning | W. Kessels | V. Longo | W. E. Kessels | F. Roozeboom | Rainer Waser
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