论文信息 - Thermal stability of Ni silicide films on heavily doped n+ and p+ Si substrates - 字舞流文

Thermal stability of Ni silicide films on heavily doped n+ and p+ Si substrates

T. Nagata | T. Chikyow | H. Iwai | P. Ahmet | K. Kakushima | K. Tsutsui | T. Shiozawa | K. Nagahiro