Annealing behavior of hydrogen-plasma-induced n-type HgCdTe
暂无分享,去创建一个
[1] B. Nener,et al. HgCdTe mid-wavelength IR photovoltaic detectors fabricated using plasma induced junction technology , 2000 .
[2] Keedong Yang,et al. Plasma induced type conversion in mercury cadmium telluride , 2002 .
[3] L. Lou,et al. Hall effect and resistivity in liquid‐phase‐epitaxial layers of HgCdTe , 1984 .
[4] Keedong Yang,et al. Junction formation by hydrogenation for HgCdTe diodes , 2001, SPIE Defense + Commercial Sensing.
[5] Keedong Yang,et al. 1/f Noise Characteristics of Hydrogenated Long-Wavelength Infrared HgCdTe Photodiode , 2004 .
[6] H. Vydyanath,et al. Annealing behavior of undoped Hg0.8Cd0.2Te epitaxial films at low temperatures , 1989 .
[7] J. Dell,et al. Mercury annealing of reactive ion etching induced p- to n-type conversion in extrinsically doped p-type HgCdTe , 1998 .
[8] C. L. Jones,et al. Effects of annealing on the electrical properties of Cd/x/Hg/1-x/Te , 1982 .
[9] A. Tóth,et al. Dynamics of native point defects in H2 and Ar plasma-etched narrow gap (HgCd)Te , 2001 .
[10] D. F. Weirauch,et al. Inhomogeneity model for anomalous Hall effects in n‐type Hg0.8Cd0.2Te liquid‐phase‐epitaxy films , 1985 .
[11] V. Walle,et al. Hydrogen as a cause of doping in zinc oxide , 2000 .
[12] Peter Capper,et al. Properties of Narrow-Gap Cadmium-Based Compounds , 1995 .
[13] Choong Ki Kim,et al. Characteristics of gradually doped LWIR diodes by hydrogenation , 2000 .