UV-curable nanoimprint resin with enhanced anti-sticking property

This paper reports on a newly developed anti-sticking resin obtained by mixing a fluorine-containing monomer (F-monomer) for UV nanoimprinting lithography (UV-NIL) to reduce the contact adhesion force during the demolding process. The new resin system shows an enhanced reliability and resolution of pattern transfer with no treatment on the surface of the quartz stamp. We fabricated various nanopatterns with F-monomer resins of various concentrations in the low pressure UV-NIL. The number of process steps of a release layer treatment for UV-NIL was reduced by using F-monomer with anti-sticking property.

[1]  S. Quake,et al.  Solvent-Resistant Photocurable “Liquid Teflon” for Microfluidic Device Fabrication , 2004 .

[2]  Zhongfan Liu,et al.  Nanoimprint lithography for the fabrication of interdigitated cantilever arrays , 2006 .

[3]  T. Michalske,et al.  Chemical vapor deposition of fluoroalkylsilane monolayer films for adhesion control in microelectromechanical systems , 2000 .

[4]  Qinghuang Lin.  Advances in Resist Technology and Processing XXIII , 2006 .

[5]  Lars Montelius,et al.  Guiding Molecular Motors with Nano-Imprinted Structures , 2005 .

[6]  John A Rogers,et al.  Soft lithography using acryloxy perfluoropolyether composite stamps. , 2007, Langmuir : the ACS journal of surfaces and colloids.

[7]  R Stanley Williams,et al.  Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography. , 2005, Langmuir : the ACS journal of surfaces and colloids.

[8]  Wei Zhang,et al.  Sub-10 nm imprint lithography and applications , 1997, 1997 55th Annual Device Research Conference Digest.

[9]  Lars Montelius,et al.  Axonal outgrowth on nano-imprinted patterns. , 2006, Biomaterials.

[10]  L. J. Guo,et al.  Nanoimprint Lithography: Methods and Material Requirements , 2007 .

[11]  Dae-Geun Choi,et al.  Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography. , 2005, Langmuir : the ACS journal of surfaces and colloids.

[12]  William J. Dauksher,et al.  Imprint lithography for integrated circuit fabrication , 2003 .

[13]  Woo Soo Kim,et al.  Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials , 2006 .

[14]  Hongqi Xu,et al.  Nanoimprint lithography for fabrication of three-terminal ballistic junctions in InP/GaInAs , 2002 .

[15]  Frances A. Houle,et al.  Adhesion between template materials and UV-cured nanoimprint resists , 2006, SPIE Advanced Lithography.

[16]  Ginger M. Denison,et al.  High-resolution soft lithography: enabling materials for nanotechnologies. , 2004, Angewandte Chemie.

[17]  Brian C. Trinque,et al.  Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography , 2004 .

[18]  Gun Young Jung,et al.  Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography , 2004 .

[19]  C. Chou,et al.  Fabrication of Size-Controllable Nanofluidic Channels by Nanoimprinting and Its Application for DNA Stretching , 2004 .

[20]  J. Kouba,et al.  Fabrication of Nanoimprint stamps for photonic crystals , 2006 .

[21]  C. Willson,et al.  Step and flash imprint lithography: Template surface treatment and defect analysis , 2000 .

[22]  H. Kurz,et al.  Fabrication of nanostructures using a UV-based imprint technique , 2000 .

[23]  Hyewon Kang,et al.  Low-Pressure Nanoimprint Lithography , 2004 .