Fabrication of 8K4K organic EL panel using high‐mobility IGZO material
暂无分享,去创建一个
Hiroyuki Miyake | Shunpei Yamazaki | Junichi Koezuka | Kenichi Okazaki | Susumu Kawashima | Masataka Shiokawa | Hideaki Shishido | Daisuke Kurosaki | S. Yamazaki | K. Okazaki | S. Kawashima | H. Shishido | H. Miyake | J. Koezuka | Yukinori Shima | Y. Shima | D. Kurosaki | Masataka Shiokawa
[1] J. Koyama,et al. P‐143: Possibility of Reflective LC Display Using Oxide Semiconductor TFTs as Electronic Paper Display , 2010 .
[2] Hideo Hosono,et al. Single‐Crystalline Films of the Homologous Series InGaO3(ZnO)m Grown by Reactive Solid‐Phase Epitaxy , 2003 .
[3] Yoshiaki Oikawa,et al. 43.4: Low Power LC Display Using In‐Ga‐Zn‐Oxide TFTs Based on Variable Frame Frequency , 2010 .
[4] Chi-Sun Hwang,et al. High performance thin film transistor with cosputtered amorphous Zn-In-Sn-O channel: Combinatorial approach , 2009 .
[5] H. Ohta,et al. Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor , 2003, Science.
[6] Yoshiaki Oikawa,et al. 18.3: Low Power 3.4inch Quarter High Definition OLED Display Using InGaZnOxide TFTs and White Tandem OLED , 2010 .
[7] Noboru Kimizuka,et al. Spinel, YbFe2O4, and Yb2Fe3O7 types of structures for compounds in the In2O3 and Sc2O3A2O3BO systems [A: Fe, Ga, or Al; B: Mg, Mn, Fe, Ni, Cu, or Zn] at temperatures over 1000°C , 1985 .
[8] Masaki Nakamura,et al. The phase relations in the In2O3Ga2ZnO4ZnO system at 1350°C , 1991 .
[9] S. Yamazaki,et al. 33.1: Channel-Etched C-Axis Aligned Crystalline Oxide Semiconductor FET Using Cu Wiring , 2014 .
[10] Masashi Tsubuku,et al. 16.1: Negative‐Bias Photodegradation Mechanism in InGaZnO TFT , 2013 .
[11] S. Yamazaki,et al. 52.3: Development of Back‐channel‐etched TFT Using C‐Axis Aligned Crystalline In‐Ga‐Zn‐Oxide , 2013 .
[12] Jun Koyama,et al. 15.1: Research, Development, and Application of Crystalline Oxide Semiconductor , 2012 .