Device reliability challenges for modern semiconductor circuit design – a review
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[1] N. Mielke,et al. Universal recovery behavior of negative bias temperature instability [PMOSFETs] , 2003, IEEE International Electron Devices Meeting 2003.
[2] Prasad Chaparala,et al. NBTI in dual gate oxide PMOSFETs , 2003, 2003 8th International Symposium Plasma- and Process-Induced Damage..
[3] S. Krishnan,et al. NBTI: An Atomic-Scale Defect Perspective , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.
[4] S. Natarajan,et al. Impact of negative bias temperature instability on digital circuit reliability , 2002, 2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320).
[5] H. Reisinger,et al. A novel multi-point NBTI characterization methodology using Smart Intermediate Stress (SIS) , 2008, 2008 IEEE International Reliability Physics Symposium.
[6] S. John,et al. NBTI impact on transistor and circuit: models, mechanisms and scaling effects [MOSFETs] , 2003, IEEE International Electron Devices Meeting 2003.
[7] H. Reisinger,et al. Analysis of NBTI Degradation- and Recovery-Behavior Based on Ultra Fast VT-Measurements , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.
[8] Karl Goser,et al. Effects of inhomogeneous negative bias temperature stress on p-channel MOSFETs of analog and RF circuits , 2005, Microelectron. Reliab..
[9] C. Schlunder,et al. Evaluation of MOSFET Reliability in Analog Applications , 2001, 31st European Solid-State Device Research Conference.
[10] K. Jeppson,et al. Negative bias stress of MOS devices at high electric fields and degradation of MNOS devices , 1977 .
[11] V. Huard,et al. Hot-Carrier acceleration factors for low power management in DC-AC stressed 40nm NMOS node at high temperature , 2009, 2009 IEEE International Reliability Physics Symposium.
[12] C. Schlunder,et al. Device reliability in analog CMOS applications , 1999, International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).
[13] M. Nelhiebel,et al. Defect Creation Stimulated by Thermally Activated Hole Trapping as the Driving Force Behind Negative Bias Temperature Instability in SiO2, SiON, and High-k Gate Stacks , 2008, 2008 IEEE International Integrated Reliability Workshop Final Report.
[14] R. Wong,et al. Impact of NBTI Induced Statistical Variation to SRAM Cell Stability , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.
[15] Chenming Hu,et al. The effects of hot-electron degradation on analog MOSFET performance , 1990, International Technical Digest on Electron Devices.
[16] Andreas Martin,et al. An introduction to fast wafer level reliability monitoring for integrated circuit mass production , 2004, Microelectron. Reliab..
[17] D. Wristers,et al. Enhanced hot-hole degradation in P/sup +/-poly PMOSFETs with oxynitride gate dielectrics , 1999, 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453).
[18] H. Reisinger,et al. A Comparison of Very Fast to Very Slow Components in Degradation and Recovery Due to NBTI and Bulk Hole Trapping to Existing Physical Models , 2007, IEEE Transactions on Device and Materials Reliability.
[19] Chenming Hu,et al. Hot-electron-induced MOSFET degradation—Model, monitor, and improvement , 1985, IEEE Transactions on Electron Devices.
[20] Karl Goser,et al. On the degradation of p-MOSFETs in analog and RF circuits under inhomogeneous negative bias temperature stress , 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..
[21] E. Crabbé,et al. NBTI-channel hot carrier effects in PMOSFETs in advanced CMOS technologies , 1997, 1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual.
[22] J.R. Hwang,et al. Hot carrier degradation in novel strained-Si nMOSFETs , 2004, 2004 IEEE International Reliability Physics Symposium. Proceedings.
[23] Andreas Martin. Review on the reliability characterization of plasma-induced damage , 2009 .
[24] T. Grasser,et al. The Universality of NBTI Relaxation and its Implications for Modeling and Characterization , 2007, 2007 IEEE International Reliability Physics Symposium Proceedings. 45th Annual.
[25] H. Reisinger,et al. A Comparison of Fast Methods for Measuring NBTI Degradation , 2007, IEEE Transactions on Device and Materials Reliability.
[26] Chenming Hu,et al. Hot-Electron-Induced MOSFET Degradation - Model, Monitor, and Improvement , 1985, IEEE Journal of Solid-State Circuits.
[27] J. Schneider,et al. Practical aspects of reliability analysis for IC designs , 2006, 2006 43rd ACM/IEEE Design Automation Conference.
[28] Karl Goser,et al. Trapping mechanisms in negative bias temperature stressed p-MOSFETs , 1999 .