论文信息 - A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation - 字舞流文

A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation

Low loss PECVD silicon nitride waveguides at 905 nm (0.2 dB/cm) and 532 nm (1.36 dB/cm) wavelengths are reported. Efficacy of phase variation measurements for identifying process conditions for optical phased array fabrication is demonstrated.

Sandeep S. Saseendran | Tangla D. Kongnyuy | Bruno Figeys | Federico Buja | Benedetto Troia | Sarp Kerman | Aleksandrs Marinins | Roelof Jansen | Xavier Rottenberg | Deniz S. Tezcan | Philippe Soussan | D. Tezcan | P. Soussan | F. Buja | X. Rottenberg | A. Marinins | R. Jansen | B. Troia | B. Figeys | T. Kongnyuy | S. Saseendran | Sarp Kerman

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