Temperature-dependent structural characterization of silicon <110> nanowires

For high speed and performance field effect transistor with high carrier mobility, vertically aligned Si <110> nanowires is demonstrated by chemical vapor deposition via a vapor-liquid-solid growth mechanism. We found that the orientation of NWs was changed from <111> direction to <110> direction on a Si (110) substrate with increasing the growth temperature above ~ 610°C by changing Au-Si eutectic phase. These vertically aligned <110> oriented SiNWs with significantly high carrier mobility opens up new opportunities for high speed and performance future electronic device applications.