Improved design of a silicon micromachined gyroscope with piezoresistive detection and electromagnetic excitation

In this paper, an improved design of a silicon micromachined gyroscope (angular rate sensor) is presented. It is based on the tuning fork principle and realized by combining two proof masses. The gyroscope is driven by electromagnetic forces and detects the Coriolis force by means of four piezoresistors connected in a Wheatstone bridge. The main fabrication steps including advanced deep reactive ion etching (ADRIE) and a wafer scale packaging are reported. The major novelty consists in a new design to reduce output drift. Both a higher symmetric mechanical structure and a separation of the first and the second mechanical resonant frequencies have been successfully investigated. This allows both driving and sensing of the device at its first resonant frequency while not exciting the second one. Thus, better uncoupling between the sensor modes has been obtained. As main results, a bandwidth of 10 Hz has been achieved and long-term measurements have been performed which were not possible with the previous design due to the low stability of the zero rate signal. For the current design, the dynamic behavior, the temperature dependence, rotation measurement, and the sensor stability have been characterized.

[1]  S. Graham Kelly,et al.  Fundamentals of Mechanical Vibrations , 1992 .

[2]  J. Bernstein,et al.  A micromachined comb-drive tuning fork rate gyroscope , 1993, [1993] Proceedings IEEE Micro Electro Mechanical Systems.

[3]  Katsuhiko Tanaka,et al.  A micromachined vibrating gyroscope , 1995, Proceedings IEEE Micro Electro Mechanical Systems. 1995.

[4]  Y. Mochida,et al.  A micromachined vibrating gyroscope , 1995 .

[5]  Huma Ashraf,et al.  Advanced silicon etching using high-density plasmas , 1995, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

[6]  Per Ohlckers,et al.  Effects of process variations in a CMOS circuit for temperature compensation of piezoresistive pressure sensors , 1995 .

[7]  Application of deep reactive ion etching for silicon angular rate sensor , 1995 .

[8]  N. F. de Rooij,et al.  A silicon micromachined tuning fork gyroscope , 1996 .

[9]  C. Berthoud,et al.  Effective static response compensation suitable for low-power ASIC implementation with an application to pressure sensors , 1996, Quality Measurement: The Indispensable Bridge between Theory and Reality (No Measurements? No Science! Joint Conference - 1996: IEEE Instrumentation and Measurement Technology Conference and IMEKO Tec.

[10]  M.-A. Grétillat,et al.  A New Fabrication Method for Borosilicate Glass Capillary Tubes with Lateral Inlets and Outlets , 1997 .

[11]  M. Gretillat,et al.  A silicon micromachined vibrating gyroscope with piezoresistive detection and electromagnetic excitation , 1996, Proceedings of Ninth International Workshop on Micro Electromechanical Systems.

[12]  H. Seppa,et al.  A bulk micromachined silicon angular rate sensor , 1997, Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97).

[13]  Ralf Voss Silicon micromachined vibrating gyroscopes , 1997, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

[14]  Cimoo Song Commercial vision of silicon based inertial sensors , 1997, Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97).

[15]  S. Jeanneret,et al.  Advanced deep reactive ion etching: a versatile tool for microelectromechanical systems , 1998 .

[16]  Bernd Folkmer,et al.  A new silicon rate gyroscope , 1998, Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176.