A Pattern Generator for E-Beam Lithography Using a Scanning Electron Microscope

A novel microcomputer-controlled vector scan pattern generator is described for the quick conversion of a Cambridge Stereoscan type of scanning electron microscope into an E-beam microlithography system, for use in a research environment or small production laboratory. A field size of up to 1 mm X 1 mm is employed, for circuit patterns appropriate to specialized high frequency, or other, planar devices. Scanning procedures and shapes can be software programmed into the pattern generator for ready application to pattern data development, while allowing substantial savings in memory storage requirements. Pattern data may be entered in decimal coordinates via a keyboard/display interface and monitor program, which allows subsequent storage of the coded data on cassette tape.

[1]  Scanning electron beam lithography for fabrication of magnetic bubble circuits , 1976 .

[2]  E. D. Wolf,et al.  Computer-controlled scanning electron microscope system for high-resolution microelectronic pattern fabrication , 1972 .

[3]  G. L. Varnell,et al.  E-Beam Writing Techniques for Semiconductor Device Fabrication , 1973 .

[4]  A. M. Patlach,et al.  Electron‐beam lithographic pattern generation system , 1978 .

[5]  J. Russ,et al.  Automatic pattern positioning of scanning electron beam exposure , 1970 .

[6]  Henry I. Smith,et al.  Application of moiré techniques in scanning‐electron‐beam lithography and microscopy , 1975 .

[7]  J. W. Stafford,et al.  EBES: A practical electron lithographic system , 1975, IEEE Transactions on Electron Devices.

[8]  C. K. Campbell,et al.  A Low Cost Digital Controller for an Electron Lithography System using a Scanning Electron Microscope , 1976, IEEE Transactions on Industrial Electronics and Control Instrumentation.

[9]  Henry I. Smith,et al.  Fabrication techniques for surface-acoustic-wave and thin-film optical devices , 1974 .

[10]  F. S. Ozdemir,et al.  Composition and detection of alignment marks for electron‐beam lithography , 1975 .

[11]  T.H.P. Chang,et al.  A computer-controlled electron-beam machine for microcircuit fabrication , 1972 .

[12]  Alan D. Wilson,et al.  Electron‐beam lithography using vector‐scan techniques , 1975 .

[13]  J. Frey,et al.  A High-Performance, Low-Cost Digitally Driven SEM System for Materials Studies and Microfabrication , 1973 .

[14]  T. H. P. Chang,et al.  Deflection distortion in scanning electron‐beam systems , 1978 .