论文信息 - Fabrication of Nanopillars based on Silicon Oxide Nanopatterns Synthesized in Oxygen Plasma Removal of Photoresist

Fabrication of Nanopillars based on Silicon Oxide Nanopatterns Synthesized in Oxygen Plasma Removal of Photoresist

We report for the first time a facile lithography-free approach for fabricating nanopillars over large areas or in patterns. The key technique of this approach is that randomly-distributed nanoscale SiO2 patterns can be synthesized on substrates simply by removing photoresist with oxygen plasma bombardment. Those SiO2 nanopatterns may further function as masks in the following etching process for nanopillars. Based on this approach, a variety of microstructures containing nanopillars with diameters of 30~200 nm, which include surface micro channels, micro-cantilever probes and nanofences, have been fabricated. This approach can be applied both to silicon and metal substrates compatible with conventional micro-electromechanical systems (MEMS) fabrication.

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