Litho and patterning challenges for memory and logic applications at the 22-nm node
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Lieve Van Look | Jo Finders | Mircea Dusa | Youri van Dommelen | Tom Vandeweyer | Peter Nikolsky | Robert Watso | Joost Beckaert | Bart Laenens | R. Watso | L. van Look | T. Vandeweyer | B. Laenens | J. Finders | M. Dusa | P. Nikolsky | Y. van Dommelen | Joost Beckaert
[1] Jens Timo Neumann,et al. Polarization-induced astigmatism caused by topographic masks , 2007, SPIE Photomask Technology.
[2] Jo Finders,et al. An IntenCD map of a reticle as a feed-forward input to DoseMapper , 2008, Photomask Japan.
[3] Jo Finders,et al. Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control , 2009, Advanced Lithography.
[4] Mireille Maenhoudt,et al. Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP) , 2009, Lithography Asia.
[5] Youri van Dommelen,et al. Evaluation of double-patterning techniques for advanced logic nodes , 2010, Advanced Lithography.
[6] Jo Finders,et al. Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements , 2010, Advanced Lithography.