CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering : A Comparative Study
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[1] L. Hultman,et al. Microstructure control of CrNx films during high power impulse magnetron sputtering , 2010 .
[2] E. Wallin,et al. Cross-field ion transport during high power impulse magnetron sputtering , 2008 .
[3] U. Helmersson,et al. Ionized physical vapor deposition (IPVD): A review of technology and applications , 2006 .
[4] J. Musil,et al. High-power pulsed sputtering using a magnetron with enhanced plasma confinement , 2007 .
[5] A. Anders. Deposition rates of high power impulse magnetron sputtering: Physics and economics , 2010 .
[6] W. Sproul,et al. The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering , 2010 .
[7] P. Kelly,et al. Magnetron sputtering: a review of recent developments and applications , 2000 .
[8] C. Mitterer,et al. Microstructure and mechanical/thermal properties of Cr–N coatings deposited by reactive unbalanced magnetron sputtering , 2001 .
[9] P. Sigmund. Sputtering of single and multiple component materials , 1980 .
[10] R. Snyders,et al. The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering , 2008 .
[11] J. Schneider,et al. A novel pulsed magnetron sputter technique utilizing very high target power densities , 1999 .
[12] S. Konstantinidis,et al. Titanium oxide thin films deposited by high-power impulse magnetron sputtering , 2006 .
[13] W. Münz,et al. A new method for hard coatings: ABSTM (arc bond sputtering) , 1992 .
[14] J. Alami,et al. Spatial electron density distribution in a high-power pulsed magnetron discharge , 2005, IEEE Transactions on Plasma Science.
[15] L. Hultman,et al. Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres , 2010 .
[16] C. Christou,et al. Ionization of sputtered material in a planar magnetron discharge , 2000 .
[17] W. Sproul,et al. High Power Pulsed Reactive Sputtering of Zirconium Oxide and Tantalum Oxide , 2004 .
[18] L. Hultman,et al. Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique , 2004 .
[19] I. Petrov,et al. High power pulsed magnetron sputtered CrNX films , 2003 .
[20] C. Reinhard,et al. Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN∕CrN physical vapor deposition coatings , 2009 .
[21] D. Christie. Target material pathways model for high power pulsed magnetron sputtering , 2005 .
[22] Matthias Wuttig,et al. On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering , 2009 .
[23] U. Helmersson,et al. The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge , 2006 .
[24] Arutiun P. Ehiasarian,et al. Ionization of sputtered metals in high power pulsed magnetron sputtering , 2005 .
[25] G. Pharr,et al. An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments , 1992 .
[26] Jeffrey Hopwood,et al. Ionized physical vapor deposition , 2000 .
[27] K. Bobzin,et al. Mechanical properties and oxidation behaviour of (Al,Cr)N and (Al,Cr,Si)N coatings for cutting tools deposited by HPPMS , 2008 .
[28] C. Reinhard,et al. CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique , 2006 .
[29] A. Matthews,et al. Structure, mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering , 1999 .
[30] W. Münz,et al. Structure and mechanical properties of CrN/TiN multilayer coatings prepared by a combined HIPIMS/UBMS deposition technique , 2008 .
[31] Erik René Kieft,et al. Refinement of Monte Carlo simulations of electron–specimen interaction in low-voltage SEM , 2008 .
[32] M. Kiuchi,et al. The formation of chromium/nitrogen phases by nitrogen ion implantation during chromium deposition as a function of ion-to-atom arrival ratio , 1997 .
[33] D. B. Lewis,et al. Chromium nitride coatings grown by unbalanced magnetron (UBM) and combined arc/unbalanced magnetron (ABS™) deposition techniques , 1996 .
[34] S. Konstantinidis,et al. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art , 2010 .
[35] M. W. Thompson. Physical mechanisms of sputtering , 1981 .