Fabrication of optical disk mastering using electron beam and embossing process

[1]  Jian-Gang Zhu,et al.  Fabrication of Flyable Perpendicular Discrete Track Media , 2007, IEEE Transactions on Magnetics.

[2]  C. Hohle,et al.  CD control of direct versus complementary exposure for shaped beam writers and its correlation to the local registration error , 2007 .

[3]  Low-Noise and Low-Environmental-Impact Reflective Material for High-Density Optical Data Storage , 2006 .

[4]  A Novel Magnetic Microdeflector for Electron Beam Control in Electron Beam Microcolumn Systems , 2006, IEEE Transactions on Magnetics.

[5]  J. Taniguchi,et al.  Fabrication of Three-Dimensional Hydrogen Silsesquioxane Resist Structure using Electron Beam Lithography , 2006 .

[6]  Y. Wada,et al.  Application of Retarding Technology to Electron Beam Recorder , 2006, 2006 Optical Data Storage Topical Meeting.

[7]  J. Jasinski,et al.  Electron-Beam Detection of Bits Reversibly Recorded on Epitaxial InSe/GaSe/Si Phase-Change Diodes , 2006 .

[8]  S. Yokoyama,et al.  Fabrication of High-Density Diamond Nanotips by Electron Beam Lithography , 2006 .

[9]  F. Yokogawa,et al.  Practical Electron Beam Recorder for High-Density Optical and Magnetic Disk Mastering , 2006 .

[10]  M. Aono,et al.  Application of Simple Mechanical Polishing to Fabrication of Nanogap Flat Electrodes , 2006 .

[11]  F. Yokogawa,et al.  Nanopattern Profile Control Technology Using Reactive Ion Etching for 100 GB Optical Disc Mastering , 2005 .

[12]  Masaki Kobayashi,et al.  Electron Beam Recording beyond 200 Gbit/in2 Density for Next Generation Optical Disk Mastering , 2005 .

[13]  G. Cartwright,et al.  Electron beam recording of optical disc , 2002 .

[14]  Dieter Adam,et al.  Maskless electron beam lithography: prospects, progress, and challenges , 2002 .

[15]  S. Hosaka,et al.  XY stages driving an electron beam mastering system for high density optical recording , 2002 .

[16]  R. C. Tiberio,et al.  Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications , 1999 .

[17]  C. David,et al.  Line width control using a defocused low voltage electron beam , 1999 .

[18]  Automatically aligned electron beam lithography on the nanometre scale , 1999 .

[19]  M. Katsumura,et al.  HIGH DENSITY MASTERING USING ELECTRON BEAM , 1998 .

[20]  S. Matsui.  Nanostructure fabrication using electron beam and its application to nanometer devices , 1997, Proc. IEEE.