A novel three-layer graded SiGe strain relaxed buffer for the high crystal quality and strained Si0.5Ge0.5 layer epitaxial grown
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A. Du | Guilei Wang | Jun Luo | Junfeng Li | H. Yin | Wenwu Wang | Qingzhu Zhang | Shihai Gu | Gaobo Xu | Xiaolei Wang | Hong Yang | Yongliang Li | Zhiqian Zhao | Yan Li | Xueli Ma