Thermal and mechanical analysis of photoresist and silylated photoresist films : application to AZ 5214 TM
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Evangelos Gogolides | Michael Hatzakis | E. Tegou | M. Hatzakis | E. Gogolides | E. Tegou | K. Papadokostaki | Konstantinos Beltsios | K. G. Papadokostaki | K. Beltsios
[1] P. Paniez,et al. Plasma etching of polymers: A reinvestigation of temperature effects , 1991 .