Nonvolatile RAM based on magnetic tunnel junction elements

Magnetoresistive random access memory (MRAM), is based on magnetic memory elements integrated with CMOS. Key attributes of MRAM technology are nonvolatility and unlimited read and write endurance. Recent advances in magnetic tunnel junction (MTJ) materials give MRAM the potential for high speed, low operating voltage, and high density.

[1]  William J. Gallagher,et al.  Microstructured magnetic tunnel junctions (invited) , 1997 .

[2]  H. Goronkin,et al.  High density nonvolatile magnetoresistive RAM , 1996, International Electron Devices Meeting. Technical Digest.

[3]  R. E. Scheuerlein Magneto-resistive IC memory limitations and architecture implications , 1998, Seventh Biennial IEEE International Nonvolatile Memory Technology Conference. Proceedings (Cat. No.98EX141).

[4]  S. Lai,et al.  Tunnel oxide and ETOX/sup TM/ flash scaling limitation , 1998, Seventh Biennial IEEE International Nonvolatile Memory Technology Conference. Proceedings (Cat. No.98EX141).

[5]  S. Lai Tunnel Oxide and ETOXtm Flash Scaling Limitation , 1998 .

[6]  J. Slaughter,et al.  Progress and outlook for MRAM technology , 1999, IEEE International Magnetics Conference.