Progress in silicon carbide semiconductor electronics technology
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[1] W. J. Choyke,et al. SiC boule growth by sublimation vapor transport , 1991 .
[2] Philip G. Neudeck,et al. 2000 V 6H-SIC P-N JUNCTION DIODES GROWN BY CHEMICAL VAPOR DEPOSITION , 1994 .
[3] Bantval J. Baliga,et al. Power semiconductor devices for variable-frequency drives , 1994, Proc. IEEE.
[4] R. Stein. Formation of macrodefects in SiC , 1993 .
[5] V. Tsvetkov,et al. Investigation of growth processes of ingots of silicon carbide single crystals , 1978 .
[6] B. J. Baliga,et al. Comparison of 6H-SiC, 3C-SiC, and Si for power devices , 1993 .
[7] P. Neudeck,et al. Electrical properties of epitaxial 3C- and 6H-SiC p-n junction diodes produced side-by-side on 6H-SiC substrates , 1994 .
[8] Philip G. Neudeck,et al. Site‐competition epitaxy for superior silicon carbide electronics , 1994 .
[9] N. Hingorani,et al. HIGH-POWER ELECTRONICS , 1993 .
[10] Phillip B. Abel,et al. Surface morphology of silicon carbide epitaxial films , 1995 .
[11] Louis J. Terminello,et al. Applications of synchrotron radiation techniques to materials science III : symposium held April 8-12, 1996, San Francisco, California, U.S.A. , 1994 .
[12] M. Shur,et al. Thin film deposition and microelectronic and optoelectronic device fabrication and characterization in monocrystalline alpha and beta silicon carbide , 1991, Proc. IEEE.
[13] J. Palmour,et al. SiC MOS interface characteristics , 1994 .
[14] P. Neudeck,et al. Greatly improved 3C-SiC p-n junction diodes grown by chemical vapor deposition , 1993, IEEE Electron Device Letters.
[15] W. C. Nieberding,et al. High-Temperature Electronic Requirements in Aeropropulsion Systems , 1981, IEEE Transactions on Industrial Electronics.
[16] J. W. Faust,et al. Silicon Carbide—1973 , 1977 .
[17] P. Neudeck,et al. Performance limiting micropipe defects in silicon carbide wafers , 1994, IEEE Electron Device Letters.
[18] Robert J. Trew,et al. The potential of diamond and SiC electronic devices for microwave and millimeter-wave power applications , 1991, Proc. IEEE.
[19] H. Grubin. The physics of semiconductor devices , 1979, IEEE Journal of Quantum Electronics.
[20] Robert F. Davis,et al. Chemical vapor deposition and characterization of 6H‐SiC thin films on off‐axis 6H‐SiC substrates , 1988 .
[21] Michael R. Melloch,et al. Characteristics of inversion-channel and buried-channel MOS devices in 6H-SiC , 1994 .
[22] Z. Feng. Semiconductor Interfaces, Microstructures and Devices: Properties and applications , 1993 .