Optical scatterometry of subwavelength diffraction gratings: neural-network approach.
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J Saarinen | E. Oja | J. Saarinen | I Kallioniemi | E Oja | I. Kallioniemi
[1] Joerg Bischoff,et al. Photoresist metrology based on light scattering , 1996, Advanced Lithography.
[2] David M. Haaland,et al. Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles , 1994 .
[3] Nicholas George,et al. Neural networks applied to diffraction-pattern sampling. , 1994, Applied optics.
[4] C. A. Hobson,et al. Diffraction pattern analysis for automatic defect classification in manufactured electronic assemblies , 1994, Electronic Imaging.
[5] Joseph B. Kruskal,et al. Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data , 1993 .
[6] Donald R. Hush,et al. Using scattered-light modeling for semiconductor critical dimension metrology and calibration , 1993, Advanced Lithography.
[7] J. McNeil,et al. Linewidth measurement of gratings on photomasks: a simple technique. , 1992, Applied optics.
[8] J. Kruskal,et al. Use of light scattering in characterizing reactively ion etched profiles , 1991 .
[9] James D. Keeler,et al. Layered Neural Networks with Gaussian Hidden Units as Universal Approximations , 1990, Neural Computation.
[10] Kurt Hornik,et al. Multilayer feedforward networks are universal approximators , 1989, Neural Networks.
[11] T. Gaylord,et al. Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings. , 1986, Applied optics.
[12] T. Gaylord,et al. Rigorous coupled-wave analysis of planar-grating diffraction , 1981 .
[13] Daniel Maystre,et al. Inverse scattering method in electromagnetic optics: Application to diffraction gratings , 1980 .
[14] A. Roger,et al. Grating profile reconstruction by an inverse scattering method , 1980 .
[15] L. Botten,et al. Groove depth determination using a laser for sinusoidal groove gratings. , 1977, Applied optics.
[16] E. Oja,et al. Neural networks – advantages and applications , 1994 .
[17] John R. McNeil,et al. SCATTEROMETRY APPLIED TO MICROELECTRONICS PROCESSING. PART II , 1993 .
[18] D. Greenberg,et al. The impact of electron transport regimes on the linearity of AlGaAs/n+-InGaAs HFETs , 1993 .
[19] G. Wallraff,et al. NEW SINGLE-LAYER POSITIVE RESISTS FOR 193- AND 248-NM LITHOGRAPHY USING METHACRYLATE POLYMERS , 1993 .