Integration of highly-strained SiGe materials in 14 nm and beyond nodes FinFET technology
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Chao Zhao | Huilong Zhu | Jun Luo | Huaxiang Yin | Guilei Wang | Henry H. Radamson | Tao Chen | Mohammadreza Kolahdouz | Junfeng Li | Tao Chen | Jun Luo | M. Kolahdouz | Guilei Wang | Junfeng Li | H. Yin | Huilong Zhu | Chao Zhao | H. Radamson | A. Abedin | M. Moeen | Yiluan Guo | Mahdi Moeen | Ahmad Abedin | Yiluan Guo | Yiluan Guo
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