In-situ film thickness and temperature monitoring using a 2 GHz acoustic phase measurement system

A 2 GHz acoustic phase measurement system has been developed and used for in-situ monitoring of thin film thickness and temperature in silicon wafer processing. Initial evaporation experiments in a vacuum station have shown a film thickness resolution of approximately 1000 AA with a potential resolution to approximately 1 AA. The potential of this system for making temperature measurements has also been explored, and initial experiments in an oven have shown a temperature resolution of 0.01 K.<<ETX>>