Iddq testing for high performance CMOS-the next ten years

CMOS scaling affects the subthreshold current per IC, and it directly impacts the utility of Iddq testing for CMOS devices. Continued IC manufacturing refinements enable a factor of /spl radic/2 reduction in line widths every three years. This in conjunction with an increase in chip size makes it possible to increase the number of transistors per IC by a factor between two and three. This trend in CMOS technology is expected to continue over at least the next ten years. The scaling of devices affects numerous device parameters, one being the subthreshold current commonly known as the leakage current. Assuming defect size scales with technology, it will be explained why it will become increasingly difficult to differentiate good and defective devices based upon an Iddq test methodology.

[1]  V. L. Rideout,et al.  Very small MOSFET's for low-temperature operation , 1977, IEEE Transactions on Electron Devices.

[2]  Peter C. Maxwell,et al.  The Effectiveness of IDDQ, Functional and Scan Tests: How Many Fault Coverages Do We Need? , 1992, ITC.

[3]  Roger Perry IDDQ testing in CMOS digital ASICs , 1992, J. Electron. Test..

[4]  Edward J. McCluskey,et al.  An experimental chip to evaluate test techniques experiment results , 1995, Proceedings of 1995 IEEE International Test Conference (ITC).

[5]  K. Steinhubl Design of Ion-Implanted MOSFET'S with Very Small Physical Dimensions , 1974 .

[6]  Robert H. Dennard,et al.  CMOS scaling for high performance and low power-the next ten years , 1995, Proc. IEEE.

[7]  Wojciech Maly,et al.  CMOS bridging fault detection , 1990, Proceedings. International Test Conference 1990.

[8]  Wojciech Maly,et al.  CMOS bridging fault detection , 1990, 1991, Proceedings. International Test Conference.

[9]  Charles F. Hawkins,et al.  IDDQ testing: A review , 1992, J. Electron. Test..

[10]  Edward J. McCluskey,et al.  An experimental chip to evaluate test techniques: chip and experiment design , 1995, Proceedings of 1995 IEEE International Test Conference (ITC).

[11]  Yashwant K. Malaiya,et al.  A New Fault Model and Testing Technique for CMOS Devices , 1982, International Test Conference.

[12]  Mark W. Levi,et al.  CMOS Is Most Testable , 1981, International Test Conference.

[13]  Yuan Taur,et al.  An ultra-low power 0.1 /spl mu/m CMOS , 1994, Proceedings of 1994 VLSI Technology Symposium.

[14]  Yuan Taur,et al.  CMOS scaling into the 21st century: 0.1 µm and beyond , 1995, IBM J. Res. Dev..

[15]  John P. Uyemura,et al.  Fundamentals of MOS digital integrated circuits , 1988 .

[16]  Charles F. Hawkins,et al.  Quiescent power supply current measurement for CMOS IC defect detection , 1989 .