论文信息 - Hydrogen microwave plasma etching of silicon dioxide at high temperatures with in situ low-coherence interferometry control - 字舞流文

Hydrogen microwave plasma etching of silicon dioxide at high temperatures with in situ low-coherence interferometry control

A. Bolshakov | V. Yurov | A. Popovich | E. Zavedeev | V. Ralchenko | A. Altakhov | I.A. Fedorova