Gradient-Based Source and Mask Optimization in Optical Lithography
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[1] Oscar Noordman,et al. Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners , 2010, Advanced Lithography.
[2] Thomas Kailath,et al. Phase-shifting masks for microlithography: automated design and mask requirements , 1994 .
[3] Will Conley,et al. Layout and source dependent transmission tuning , 2004, SPIE Advanced Lithography.
[4] M. Levenson,et al. Improving resolution in photolithography with a phase-shifting mask , 1982, IEEE Transactions on Electron Devices.
[5] Peyman Milanfar,et al. OPC and PSM design using inverse lithography: a nonlinear optimization approach , 2006, SPIE Advanced Lithography.
[6] D. Fehrs,et al. Illuminator modification of an optical aligner , 2004 .
[7] Vladimir S. Pavelyev,et al. Novel continuously shaped diffractive optical elements enable high efficiency beam shaping , 2010, Advanced Lithography.
[8] Oscar Noordman,et al. Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems , 2010, Advanced Lithography.
[9] Xu Ma,et al. Binary mask optimization for inverse lithography with partially coherent illumination , 2008, Lithography Asia.
[10] Chris A. Mack. Optimum stepper performance through image manipulation , 2004 .
[11] Wei Xiong,et al. A robust pixel-based RET optimization algorithm independent of initial conditions , 2010, 2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC).
[12] Robert Socha,et al. Simultaneous source mask optimization (SMO) , 2005, Photomask Japan.
[13] Yuri Granik,et al. Solving inverse problems of optical microlithography , 2005, SPIE Advanced Lithography.
[14] Xu Ma,et al. PSM design for inverse lithography with partially coherent illumination , 2008, Advanced Lithography.
[15] Vikram Tolani,et al. Source-mask co-optimization (SMO) using level set methods , 2009, Photomask Technology.
[16] Jared D. Stack,et al. Advances in DOE modeling and optical performance for SMO applications , 2010, Advanced Lithography.
[17] Kafai Lai,et al. Optimum mask and source patterns to print a given shape , 2001, SPIE Advanced Lithography.
[18] Lawrence S. Melvin,et al. Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA , 2009, Lithography Asia.
[19] Bahaa E. A. Saleh,et al. Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks , 1981 .
[20] Amyn Poonawala,et al. Mask Design for Optical Microlithography—An Inverse Imaging Problem , 2007, IEEE Transactions on Image Processing.
[21] G. Arce,et al. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography. , 2009, Optics express.
[22] Wei Xiong,et al. A highly efficient optimization algorithm for pixel manipulation in inverse lithography technique , 2008, 2008 IEEE/ACM International Conference on Computer-Aided Design.