Optimized antireflection coatings for high-efficiency silicon solar cells

Antireflection coatings for silicon solar cells have been optimized both theoretically and experimentally for a range of possible situations, such as single-layer and double-layer coatings, and on planar and microgrooved surfaces. The effect of a thin passivating silicon dioxide layer under the coating was also considered. A critical passivating oxide thickness of about 300 AA was found to be important for the design of these coatings. A new half-quarter-wavelength double layer antireflection coating can be achieved with very low reflection if the passivating oxide has to be thicker than this critical thickness. >