Transfer etching of bilayer resists in oxygen-based plasmas
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Donald C. Hofer | Marie Angelopoulos | John P. Simons | Qinghuang Lin | David R. Medeiros | Karen Petrillo | Arpan P. Mahorowala | Ratnam Sooriyakumaran | Katherina Babich | J. W. Taylor | K. Petrillo | R. Sooriyakumaran | K. Babich | J. P. Simons | D. Hofer | Q. Lin | M. Angelopoulos | A. Mahorowala | J. Taylor | G. W. Reynolds | G. Reynolds | D. Medeiros
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