Photoemission electron microscopy (PEEM) has turned out to be one of the most promising methods for surface analysis in the recent years. It is a full field imaging technique based on the emission of secondary electrons by far ultraviolet light or X-rays. The emission intensity of secondary electrons is critically dependent upon the acceptance angle of the incident radiation. However, the size of the microscope restricts this angle substantially. Miniaturizing the objective lens of the microscope reduces the restriction of the acceptance angle and improves the performance of the PEEM considerably. We report on the fabrication of a miniaturized objective lens containing the extraction electrode, the electron column, the contrast aperture and the electron optical correction system for a PEEM. The extraction electrode as well as the electron column have been manufactured using precision milling techniques and electron discharge micromachining. For the fabrication of the correction system (stigmator / bending unit), a process combining aligned photolithography into a thick SU-8 resist and electroforming has been used. All electrodes were made in gold with a height of 150 (mu) m. After attaching a FOTURAN substrate to the electrode and etching under the electrodes, free standing apertures in an octupole and quadruple arrangement were obtained. The outer diameter of the electrodes is 5 mm and the inner diameter is 1 mm, respectively. Each electrode is connect individually to the external power supply which controls their operation. The overall size of the miniaturized objective lens is 23 mm, which has reduced the size of the lens by one order of magnitude when compared to commercially available instruments.