Performance of a double-multilayer monochromator at Beamline 2-BM at the Advanced Photon Source

We describe the performance of the double-multilayer monochromator that is installed at bending magnet beamline 2-BM at the Advanced Photon Source. In order to achieve continuous operation over energies from 3.2 to 10.9 keV, four different multilayer stripes were deposited onto Si substrates using the in-house sputtering deposition facility at the APS. The optical performance of the four stripes depends on their operating energy ranges, and produces 45%–75% peak reflectivity at first-order reflection with a 1%–6% bandwidth and a total flux increase of 20–40 compared to the Si(111) double-crystal monochromator.