Influence of deposition temperature and SiO2 overcoat layer on laser resistance of 532-nm high-reflection coating

Abstract. In this work, 532-nm high-reflection (HR) coatings have been deposited at different deposition temperatures by electron-beam evaporation technology. The spectral performance, e-field distribution, surface roughness, stoichiometry, as well as the laser resistance of the prepared 532-nm HR coatings are investigated. Experimental results indicate that the LIDT of the 532-nm HR coatings can be greatly influenced by deposition temperature. A relatively high deposition temperature benefits the crystallization and oxidation, and improves the LIDT of the 532-nm HR coatings. In addition, the SiO2 overcoat layer is also demonstrated to be effective in suppressing the delamination damage morphology and improving the LIDT of the 532-nm HR coatings.

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