Investigation of charging damage induced V/sub t/ mismatch for submicron mixed-signal technology

In analog and mixed-signal circuit applications, control of transistor analog parameters such as threshold voltage (V/sub t/) mismatch of differential pairs becomes crucial to achieve precise circuit performance. In this paper, it is illustrated that small poly and metal "antennae" can result in severe V/sub t/ mismatch during the processes such as high dose implantation, metal etch and ashing. To realize excellent analog and/or mixed-signal performance, both process optimization and circuit protection solutions are important in minimizing the adverse effect of V/sub t/ mismatch.