论文信息 - Dependence of SiO2/Si interface structure on low-temperature oxidation process - 字舞流文

Dependence of SiO2/Si interface structure on low-temperature oxidation process

T. Hattori | H. Nohira | K. Takahashi | Keisuke L. I. Kobayashi | K. Azuma | T. Yoshida | Y. Takata | S. Shin | Y. Nakata | M. Shioji | T. Shiraishi